Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen

• Authors: SCHMIDTOVÁ Tereza; VAŠINA Petr
• Year of publication: 2009
• Type: Article in Proceedings
• Conference: Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: modelling; magnetron
• Description: Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen, procceding

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