Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics

• Authors: ELIÁŠ Marek; SOUČEK Pavel; VAŠINA Petr
• Year of publication: 2009
• Type: Article in Proceedings
• Conference: Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: hybrid PVD-PECVD
• Description: Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics, proceeding

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