Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions

• Authors: VAŠINA Petr; SCHMIDTOVÁ Tereza; ELIÁŠ Marek
• Year of publication: 2009
• Type: Article in Periodical
• Magazine / Source: Plasma Sources Science and Technology
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: magnetron sputtering; reactive; Berg
• Description: The paper model reactive magnetron sputtering deposition process by modified Bergs model. We test also role of different temperature conditions on hysteresys behaviour and role of non-uniform discharge current density.

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