Publication details
Comparative study on hydrogenated and deuterated amorphous carbon films deposited by RF PECVD
| Authors | |
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| Year of publication | 2010 |
| Type | Conference abstract |
| MU Faculty or unit | |
| Citation | |
| Description | The aim of this work is to characterize and compare the properties of hydrogenated carbon thin films (HDLC) and deuterated carbon thin films (DDLC) deposited by r.f. plasma enhanced chemical vapor deposition (PECVD) from two different precursor mixtures methane/hydrogen (CH4/H2) and methane/deuterium (CH4/D2) on single crystalline silicon, glass and polycarbonate substrates. The experiments were performed at the same deposition parameters, changing only the precursor gas mixtures. The characterization of the thin films surface was done by contact angle measurements and surface energy calculation. The mechanical tests were performed mainly using depth sensing indentation method. We focused our attention on the following coating properties: hardness, elastic modulus, fracture toughness, film-substrate adhesion and internal stress. Moreover, we studied the effect of the internal stress on the indentation response of the film-substrate systems. The results were completed by advanced plasma diagnostics performed by means of optical emission spectroscopy (OES). |