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Povrchová plazmová úprava krystalických křemíkových desek určených pro výrobu solárních článků
Title in English | Plasma treatment of crystalline silicon wafers for production of solar cells |
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Authors | |
Year of publication | 2010 |
Type | Article in Proceedings |
Conference | Sborník příspěvků z 5. České fotovoltaické konference |
MU Faculty or unit | |
Citation | |
Field | Plasma physics |
Keywords | Crystalline silicon atmospheric pressure plasma surface modification |
Description | Contribution focused to application of atmospheric plasma in semiconductor industry, especially in production of solar cells. Plasma modification of surface properties of silicon wafers by DCSBD was investigated. This process makes all surfaces totaly wettable. Surface free energy was studied by contact angle measurement. |
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