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prof. Mgr. Petr Vašina, Ph.D.
ředitel ústavu – Ústav fyziky a technologií plazmatu
kancelář: pav. 06/01025
Kotlářská 267/2
611 37 Brno
telefon: | 549 49 6479 |
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sociální a akademické sítě: |
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Počet publikací: 385
2005
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Study of High Power Pulsed Microwave Discharge Afterglow
Book of Contributed Papers of 15th Symphosium on Applications on Plasma Processes and 3rd EU-Japan Joint Symphosium on Plasma Processing, rok: 2005
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Theoretical study of pulsed microwave discharge in nitrogen
Plasma Sources Sci. Technol., rok: 2005, ročník: 14, vydání: 4
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Time resolved measurements of the N2-O2 afterglow
Abstracts of Frontiers in Low Temperature Plasma Diagnostics VI, rok: 2005
2004
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Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma
Prosseding of Ninth International Conference on Plasma Surface Engineering, rok: 2004
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Electron density measurements in afterglow of high power pulsed microwave discharge
Plasma Sources Sci. Technol., rok: 2004, ročník: 13, vydání: 4
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Fast dynamics of ionized species in high power pulsed magnetron discharge
Bulletin of the American Physical Society, Series II, Vol. 49, No. 5, rok: 2004
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Preionised pulsed magnetron discharge for ionised physical vapour deposition
Proceeding of Seventeenth European Conference on Atomic & Molecular Physics of Ionized Gases, rok: 2004
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Recent Developments on Ionized Physical Vapour Deposition: Concepts, Determination of the Ionization Efficiency and Improvement of Deposited Films
Nanostructured Thin Films and Nanodispersion Strengthened Coating, rok: 2004, počet stran: 9 s.
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Simultaneous determination of N and O atom density in N2 - O2 plasma afterglow by NO titration
Proceeding of Seventeenth European Conference on Atomic & Molecular Physics of Ionized Gases, rok: 2004
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Simultaneous measurement of N and O densities in plasma afterglow by means of NO titration
Plasma Sources Sci. Technol., rok: 2004, ročník: 13, vydání: 4