Project information
Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev
- Project Identification
- GAP205/12/0407
- Project Period
- 1/2012 - 12/2016
- Investor / Pogramme / Project type
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Czech Science Foundation
- Standard Projects
- MU Faculty or unit
- Faculty of Science
Tento projekt je zaměřen na studium chování hybridního PVD-PECVD procesu, který bude využit pro přípravu nanostrukturovaných kompozitních materiálů typu n-MC/a-C(:H). Hlavním cílem tohoto projektu je provést rozsáhlou diagnostiku depozičního plazmatu a porozumět souvislostem mezi parametry depozičního procesu, vlastnostmi depozičního plazmatu a vlastnostmi deponovaných vrstev.
Publications
Total number of publications: 60
2015
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Influence of pulse off time on temporal evolution of sputtered species densities in a HiPIMS discharge
Year: 2015, type: Conference abstract
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Influence of pulse off time on temporal evolution of sputtered species densities in HIPIMS discharge
Year: 2015, type: Conference abstract
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Nanocomposite nc-TiC/a-C:H protective coatings: from process characterization to mass production
Year: 2015, type: Conference abstract
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Observation of cathode voltage and discharge current oscillations and spoke behaviour in HiPIMS
Book of Contributed Papers, year: 2015
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Reactive argon/acetylene HiPIMS discharge – time-resolved diagnostic of present species
Year: 2015, type: Conference abstract
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Spoke induced cathode voltage and discharge current oscillations in HiPIMS
Year: 2015, type: Conference abstract
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Structure and mechanical properties of Ni doped nc-TiC/a-C(:H) coatings
Potential Application of Plasma and Nanomaterials 2015. Book of Contributed Papers, year: 2015
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Study of Ni doped nc-TiC/a-C(:H) coatings prepared by hybrid PVD-PECVD process
Year: 2015, type: Conference abstract
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Temporal evolution of sputtered species densities in multi-pulse HiPIMS discharge
Year: 2015, type: Conference abstract
2014
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Automatic and robust deposition process control to grow hard nc-TiC/a-C:H coatings using industrial magnetron sputtering devices
Year: 2014, type: Conference abstract