Deposition of DLC:Si(O) Films in Low Pressure Discharges

• Authors: ZAJÍČKOVÁ Lenka; BURŠÍKOVÁ Vilma; PEŘINA Vratislav; MACKOVÁ Anna; JANČA Jan
• Year of publication: 2001
• Type: Article in Proceedings
• Conference: Proceedings of 13th Symposium on Application of Plasma Processes
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: DLC; Plasma Enhanced CVD; RF Discharges
• Description: Study of the properties of silicon doped DLC films deposited in rf low pressure discharges. Investigation of the influence of the deposition parameters on the film properties.

Related projects

• Development and Industrialization of Novel Superhard Nanocrystalline Composite Wear Protective Coatings
• Research and development and industrializartion of novel super hard nanocrystalline materials
• Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate
• Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used
• Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates