Informace o publikaci
Coplanar and non-coplanar x-ray reflectivity characterization of lateral W/Si multilayer gratings
| Autoři | |
|---|---|
| Rok publikování | 2001 |
| Druh | Článek v odborném periodiku |
| Časopis / Zdroj | J. Phys. D: Appl. Phys. |
| Fakulta / Pracoviště MU | |
| Citace | |
| www | http://www.sci.muni.cz/~mikulik/Publications.html#MikulikJergelBaumbachMPLOTHK-JPD-2001 |
| Obor | Fyzika pevných látek a magnetismus |
| Klíčová slova | reflectivity; xrr; x-uv optics; gratings; w/si; x-ray |
| Popis | Structural characterization of a fully etched amorphous W/Si multilayer grating with a lateral periodicity of 800 nm is performed by x-ray reflectivity in the coplanar and non-coplanar modes using a scintillation detector and a two-dimensional gas-filled detector, respectively. Three-dimensional reciprocal space constructions were used to explain the scattering features recorded in both geometries. Coplanar coherent grating truncation rods were fitted by a dynamical theory for rough gratings. Comparison of the reflectivity from the reference planar multilayer completes the study. |
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