prof. RNDr. Ivan Ohlídal, DrSc.
Head, Optics for Thin films and Solid surfaces
office: pav. 06/01031
Kotlářská 267/2
611 37 Brno
phone: | +420 549 49 6244 |
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e‑mail: |
social and academic networks: |
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Total number of publications: 202
2020
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Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers
Optics Express, year: 2020, volume: 28, edition: 1, DOI
2019
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Approximate methods for the optical characterization of inhomogeneous thin films: Applications to silicon nitride films
Journal of Electrical Engineering, year: 2019, volume: 70, edition: 7, DOI
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Approximations of reflection and transmission coefficients of inhomogeneous thin films based on multiple-beam interference model
Thin Solid Films, year: 2019, volume: 692, edition: 31 December 2019, DOI
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Combination of spectroscopic ellipsometry and spectroscopic reflectometry with including light scattering in the optical characterization of randomly rough silicon surfaces covered by native oxide layers
Surface Topography: Metrology and Properties, year: 2019, volume: 7, edition: 4, DOI
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Efficient method to calculate the optical quantities of multi-layer systems with randomly rough boundaries using the Rayleigh Rice theory
Physica Scripta, year: 2019, volume: 94, edition: 4, DOI
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Optical characterization of inhomogeneous thin films containing transition layers using the combined method of spectroscopic ellipsometry and spectroscopic reflectometry based on multiple-beam interference model
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, year: 2019, volume: 37, edition: 6, DOI
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Optical Characterization of Non-Stoichiometric Silicon Nitride Films Exhibiting Combined Defects
Coatings, year: 2019, volume: 9, edition: 7, DOI
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Optical properties of the crystalline silicon wafers described using the universal dispersion model
Journal of Vacuum Science & Technology B, year: 2019, volume: 37, edition: 6, DOI
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Temperature dependent dispersion models applicable in solid state physics
Journal of Electrical Engineering, year: 2019, volume: 70, edition: 7, DOI
2018
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Determination of thicknesses and temperatures of crystalline silicon wafers from optical measurements in the far infrared region
Journal of Applied Physics, year: 2018, volume: 123, edition: 18, DOI