Project information
Study of plasmachemical processes using microwave and optical spectroscopy
- Project Identification
- GP202/01/P106
- Project Period
- 1/2001 - 1/2003
- Investor / Pogramme / Project type
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Czech Science Foundation
- Postdoctoral projects
- MU Faculty or unit
- Faculty of Science
Selected plasmachemical reactions in various types of discharges (low pressure radiofrequency discharge, low pressure DC discharge, low pressure microwave discharge, atmospheric pressure microwave torch, atmospheric pressure glow, etc.) will be studied b y means of electron paramagnetic resonance (EPR) spectroscopy and optical emission spectroscopy (OES). The project will concentrate on three main research topics: (i) influence of admixtures on heterogeneous reactions on the surface of a discharge tube, particularly the surface recombination of atoms. Concentration of selected atoms in the afterglow will be measured in dependence on amount of impurity, afterglow position, wall temperature, etc. The goal is to understand better this process, describe it both experimentally and theoretically and finally draw the conclusions about possible applications in industry (e.g. higher nitridation rate). (ii) Determination of rate constants of main reactions between organosilicon compounds (TEOS, HMDSO, HMDSZ, OMT
Publications
Total number of publications: 35
2002
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Measurement of concentration of N atoms in afterglow
Czech. J. Phys., year: 2002, volume: 52-D, edition: 52-D
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Plasmachemical nitridation of boron precursors
Czech. J. Phys., year: 2002, volume: 52, edition: 52
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Plasmachemical synthesis of tungsten carbide
Proc.12 Joint Seminar" Development of Material Science in Research and Education, year: 2002
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Plasmachemical synthesis of tungsten carbide for catalysis
CHISA 2002, year: 2002
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Simultaneous plasmachemical reduction of mixed tungsten and titanion precursors
Czech. Jourmal of Physics, year: 2002, volume: 2002, edition: 52
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Study of mode transition in low pressure capacitive RF discharges in nitrogen
Czech. J. Phys., year: 2002, volume: 52, edition: 52
2001
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Atomic nitrogen concentration in afterglow measured by EPR and NO titration methods
Proceedings of XXVth ICPIG, year: 2001
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Deposition of hard carbon films and its diagnostics
Juniormat'01, year: 2001
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Determination of rate constant of N+HMDSZ gas phase chemical reaction by means of EPR
SAPP 13th Symposium Proceedings, year: 2001
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Diagnostics and monitoring of TiN/AlN deposition process
Year: 2001, type: R&D Presentation