doc. Mgr. Lenka Zajíčková, Ph.D.
Associate professor, Department of Condensed Matter Physics
correspondence Address:
Kotlářská 267/2, 611 37 Brno
office: E112
Kolejní 2906/4
612 00 Brno
phone: | +420 541 149 223 |
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e‑mail: |
social and academic networks: |
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Total number of publications: 340
2001
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Stanovení povrchové energie diamantu-podobných vrstev nanášených v plazmatu vysokofrekvenčního výboje
53, ZJAZD CHEMICKÝCH SPOLOČNOSTÍ, Zborník príspevkov, year: 2001
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Stanovení povrchové energie tenkých vrstev nanášených v plazmatu vysokofrekvenčního výboje
JUNIORMAT 01, year: 2001
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The deposition process based on silicon-organic compounds (HMDSO, TEOS) in two different types of an atmospheric barrier discharge
Proceedings of 15th International Symposium on Plasma Chemistry, year: 2001
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Thin Films Deposited from Ar/C2H2 by Pulsed RF PECVD: Deposition Profiles in Tubular Plug-Flow Reactor
JUNIORMAT 01, year: 2001
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XPS and Ellipsometric Study of DLC/Silicon Interface
Vacuum, year: 2001, volume: 61, edition: 2-4
2000
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Deposition of nanocomposite CNx/SiO films in inductively coupled r.f. discharge
Diamond and Related Materials, year: 2000, volume: 9, edition: 7
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Deposits from Hexamethyldisiloxane in a Dielectric Barrier Discharge at Atmospheric Pressure
Proceedings of HAKONE VII, year: 2000
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Characterization of CNx/SiOy Films Prepared by the Inductively Coupled RF Discharge
Czechoslovak Journal of Physics, year: 2000, volume: 2000, edition: 50(S3)
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Influence of Discharge Parameters on Composition of Films Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures
Abstracts of Invited Lectures and Contributed Papers, XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases, year: 2000
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Low Pressure Plasma Treatment of Polycarbonate
Electrophysical and Thermophysical Processes in Low-Pressure Plasma, year: 2000