prof. Mgr. Petr Vašina, Ph.D.

2010

• Monitoring of magnetron target poisoning by measurement of higher harmonics of discharge voltages

  DVOŘÁK Pavel VAŠINA Petr

  Article in Periodical

  Plasma Sources Sci. Technol., year: 2010, volume: 19, edition: 5

• Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage

  DVOŘÁK Pavel VAŠINA Petr BURŠÍKOVÁ Vilma ŽEMLIČKA Radek

  Article in Periodical

  Plasma Physics and Controlled Fusion, year: 2010, volume: 52, edition: 12, DOI

• Plasma diagnostics using electron paramagnetic resonance

  KUDRLE Vít VAŠINA Petr TÁLSKÝ Antonín VOLFOVÁ Martina ŠTEC Ondřej JANČA Jan

  Article in Periodical

  Journal of Physics D: Applied physics, year: 2010, volume: 43, edition: 12

• Preparation of self-adhesive nc-TiC/a-C:H coatings

  SOUČEK Pavel EL MEL Abdelazziz TESSIER Pierre-Yves ELIÁŠ Marek BURŠÍKOVÁ Vilma VAŠINA Petr

  Article in Proceedings

  Potential and Applications of Thin Ceramic and Metal Coatings, year: 2010

• Suppressed hysteresis behaviour of Ti sputtering in acetylene gas

  SCHMIDTOVÁ Tereza VAŠINA Petr ELIÁŠ Marek

  Conference abstract

  Year: 2010, type: Conference abstract

• Time resolved investigations of high power pulsed microwave discharge in nitrogen and neon

  HNILICA Jaroslav KUDRLE Vít VAŠINA Petr

  Article in Proceedings

  Proceedings of 24th Symposium on Plasma Physics and Technology, year: 2010

• Time resolved spectroscopy of high power pulsed microwave discharge in nitrogen

  HNILICA Jaroslav KUDRLE Vít VAŠINA Petr

  Article in Proceedings

  Proceedings of 20th Escampig, year: 2010

2009

• Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process

  VAŠINA Petr DVOŘÁK Pavel

  Article in Periodical

  Europhysics Letters, year: 2009, volume: 85, edition: 1

• Higher harmonic frequencies of discharge voltages as extremely sensitive marker of state of RF reactive sputtering deposition process

  VAŠINA Petr DVOŘÁK Pavel

  Article in Proceedings

  Book of Contributed Papers of 17th Symposium on Applications of Plasma Processes, year: 2009

• Higher harmonics of discharge voltage as tool to control accurately state of RF sputtering deposition process

  DVOŘÁK Pavel VAŠINA Petr

  Conference abstract

  Year: 2009, type: Conference abstract