prof. Mgr. Petr Vašina, Ph.D.
Department head, Department of Plasma Physics and Technology
Office: pav. 06/01025
Kotlářská 267/2
611 37 Brno
Phone: | +420 549 49 6479 |
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social and academic networks: |
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Total number of publications: 387
2009
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Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics
Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8, year: 2009
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Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?
Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts, year: 2009
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Modeling of reactive magnetron sputtering deposition process - different target utilization, situation when O2 and H2 are added simultaneously
Year: 2009, type: Conference abstract
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Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen
Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8, year: 2009
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Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions
Plasma Sources Science and Technology, year: 2009, volume: 18, edition: 2
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On the oxygen addition into nitrogen post-discharge
Journal of Physics D: Applied Physics, year: 2009, volume: 42, edition: 7
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Plasma diagnostics using electron paramagnetic resonance
Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics, year: 2009
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Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously
Year: 2009, type: Conference abstract
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Spectroscopic investigation of high power pulsed microwave discharge
Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8, year: 2009
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Suppressed hysteresis behaviour of titanium sputtering in acetylene gas.
Year: 2009, type: Conference abstract