prof. Mgr. Petr Vašina, Ph.D.

2008

• Influence of N2 and CH4 on depositon rate of boron based thin films prepared by magnetron sputtering

  ELIÁŠ Marek SOUČEK Pavel VAŠINA Petr

  Article in Periodical

  Chemické listy, year: 2008, volume: 102, edition: S4

• Ionization Processes and Plasma Chemistry in Pulsed RF Glow Discharge TOF Mass Spectroscopy for Thin Film Depth Profile Analyses

  GROZA A. SURMEIAN A. DIPLASU C. TEMPEZ A. CHAPON P. LOBO L. BORDEL L. SCHMIDTOVÁ Tereza VAŠINA Petr BELENGUER P. NELIS T. GUILLOT P. TUCCITO N. LICCIARDELLO A.

  Article in Proceedings

  Book of Abstracts, Second Central European Symposium on Plasma Chemistry, year: 2008

• Limits for H, N, O and O2 Detection by Means of Electron Paramagnetic Resonance

  MRÁZKOVÁ Martina KUDRLE Vít VAŠINA Petr TÁLSKÝ Antonín

  Article in Proceedings

  19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts, year: 2008

• Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process

  DVOŘÁK Pavel VAŠINA Petr

  Article in Proceedings

  Programme and Abstract Book of the 23rd Symposium on Plasma Physics and Technology, year: 2008

• Modeling of Radial Variation of Target Poisoning During Reactive Sputtering Deposition Process

  VAŠINA Petr HYTKOVÁ Tereza ELIÁŠ Marek

  Article in Proceedings

  19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts, year: 2008

• Modeling of reactive sputtering process with non-linear discharge current density

  SCHMIDTOVÁ Tereza VAŠINA Petr

  Article in Proceedings

  Book of Extended Abstracts of 2nd Central European Symposium on Plasma Chemistry, year: 2008

• Nitrogen Atom Behaviour in N2 Post-Discharge

  MRÁZKOVÁ Martina KUDRLE Vít VAŠINA Petr PINTASSILGO Carlos Daniel GUERRA Vasco TÁLSKÝ Antonín

  Article in Proceedings

  19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts, year: 2008

• Processes in afterglow of N2-O2 discharges

  KUDRLE Vít VAŠINA Petr NOVOTNÝ Petr TÁLSKÝ Antonín MRÁZKOVÁ Martina

  Article in Proceedings

  Book of Extended Abstracts of 2nd Central European Symposium on Plasma Chemistry, year: 2008

• Role of Neutral Gas Temperature on Hysteresis Behaviour of Reactive Sputtering Deposition Process

  VAŠINA Petr HYTKOVÁ Tereza ELIÁŠ Marek

  Article in Proceedings

  Programme and Abstract Book of 23rd Symposium on Plasma Physics and Technology, Prague, Czech Republic, 16.-19.June 2008, year: 2008

• Self-consistent spatio-temporal simulation of pulsed microwave discharge

  BONAVENTURA Zdeněk TRUNEC David MEŠKO Marcel VAŠINA Petr KUDRLE Vít

  Article in Periodical

  Journal of Physics D: Applied Physics, year: 2008, volume: 41, edition: 1